Micromachines, Vol. 14, Pages 1090: Performance Degradation in Static Random Access Memory of 10 nm Node FinFET Owing to Displacement Defects

Micromachines, Vol. 14, Pages 1090: Performance Degradation in Static Random Access Memory of 10 nm Node FinFET Owing to Displacement Defects

Micromachines doi: 10.3390/mi14051090

Authors: Minji Bang Jonghyeon Ha Gyeongyeop Lee Minki Suh Jungsik Kim

We comprehensively investigate displacement-defect-induced current and static noise margin variations in six-transistor (6T) static random access memory (SRAM) based on a 10 nm node fin field-effect transistor (FinFET) using technology computer-aided design (TCAD). Various defect cluster conditions and fin structures are considered as variables to estimate the worst-case scenario for displacement defects. The rectangular defect clusters capture more widely distributed charges at the fin top, reducing the on- and off-current. The read static noise margin (RSNM) is the most degraded in the pull-down transistor during the read operation. The increased fin width decreases the RSNM due to the gate field. The current per cross-sectional area increases when the fin height decreases, but the energy barrier lowering by the gate field is similar. Therefore, the reduced fin width and increased fin height structure suit the 10 nm node FinFET 6T SRAMs with high radiation hardness.